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Combinatorial Pulsed Laser Deposition System
Combinatorial Pulsed Laser Deposition System
Combinatorial Pulsed Laser Deposition System
Combinatorial Pulsed Laser Deposition System
Combinatorial Pulsed Laser Deposition System
Combinatorial Pulsed Laser Deposition System
Combinatorial Pulsed Laser Deposition System
Combinatorial Pulsed Laser Deposition System
Neocera
Combinatorial Pulsed Laser Deposition System
The ability to produce many different material compositions in a single deposition run greatly accelerates the time to arrive at an optimum composition having the desired material properties. Continuous Composition Spread PLD (CCS-PLD) is based on the deposition rate profiles naturally occurring in PLD as a result of the Cosn (θ) (5 ≤ n ≤ 11) dependence. PLD-CCS benefits from the proven ease of multi-layer depositions using Neocera software and the intrinsic forward-directed nature of the PLD process to vary the composition of a binary/ternary/quaternary phase spread. PLD-CCS varies the material in an analog scheme, rather than in discrete elements, thus eliminating the need for masks. This allows for a very rapid successive deposition of each constituent at a rate of much less than a mono-layer per cycle, resulting in an approach that is fundamentally equivalent to a co-deposition method. The fact that this method does not depend on a post-deposition anneal to promote inter-diffusion or crystallization makes it applicable to studies where growth temperature is a critical parameter, or to situations where high-temperature anneals are incompatible with either the deposited material or the substrate. As no masks are used, this technique can operate in a wide dynamic range of pressures (up to about 500 mTorr) which are typically not possible in a mask-based approach. Neocera PLD systems can provide both combinatorial PLD (CCS-PLD) and standard PLD capabilities within the same system.